The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2025

Filed:

Sep. 27, 2023
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventor:

Seiya Masuda, Haibara-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/02 (2006.01); H03H 7/42 (2006.01); H05K 1/18 (2006.01); H05K 3/00 (2006.01);
U.S. Cl.
CPC ...
H05K 1/0216 (2013.01); H03H 7/425 (2013.01); H05K 1/181 (2013.01); H05K 3/00 (2013.01);
Abstract

Provided are a structure having excellent shielding performance against electromagnetic waves in a frequency band of several tens of GHz, and a composition. Further, provided is a method for manufacturing a structure which makes it possible to easily manufacture a structure having excellent shielding performance against electromagnetic waves in a frequency band of several tens of GHz. The structure includes a substrate, a plurality of passive elements disposed on the substrate, and an electromagnetic wave absorbing film positioned at least in a region between the plurality of passive elements disposed on the substrate. The passive element is selected from the group consisting of an inductor and a balun. The electromagnetic wave absorbing film contains magnetic particles. In a case where a real part of a complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ' and a complex part of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ″, the complex part μ″ of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film satisfies any one of requirements 1 to 3. Requirement 1: μ″ at a frequency of 28 GHz is 0.1 to 10, Requirement 2: μ″ at a frequency of 47 GHz is 0.1 to 5, and Requirement 3: μ″ at a frequency of 60 GHz is 0.1 to 2.


Find Patent Forward Citations

Masuda, Seiya. (2025). Structure, method for manufacturing structure, and composition (U.S. Patent No. 12452994). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12452994

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…