The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Jun. 11, 2024
Beckman Coulter, Inc., Miami, FL (US);
Jiuliu Lu, Miami, FL (US);
Bian Qian, Miami, FL (US);
John S. Riley, Miami, FL (US);
Bart Wanders, Trabuco Canyon, CA (US);
Ken Good, Pasadena, CA (US);
Beckman Coulter, Inc., Miami, FL (US);
Abstract
A focusing distance (e.g., a distance between a focal plane of a camera used when n image was captured and the actual focal plane for an in-focus image) in a visual analysis system may be determined by subjecting one or more images captured by such a system to a multi-layer analysis. In such an analysis, an input may be subjected to one or more convolution filters, and the ultimate result of such convolution may be provided to a dense layer which can provide the focusing distance. This focusing distance may then be used to (re)focus a camera or for other purposes (e.g., generating an alert).