The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2025

Filed:

Nov. 14, 2023
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventor:

Noritake Sumi, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 5/02 (2006.01); B08B 7/00 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02101 (2013.01); B08B 5/02 (2013.01); B08B 7/0021 (2013.01); H01L 21/68742 (2013.01);
Abstract

A substrate processing method according to this invention includes supporting a substrate having a liquid film on an upper surface substantially in a horizontal posture by placing the substrate on a flat plate-like support tray, accommodating the support tray into an internal space of a chamber and sealing the internal space, introducing a gas which is pressurized toward a gap space between a lower surface of the support tray and a bottom surface of the internal space, and processing the substrate by a supercritical processing fluid by introducing the supercritical processing fluid into the internal space. This makes it possible to shorten a time required to remove a liquid adhering to the lower surface of a substrate being carried into a chamber.


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