The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 21, 2025

Filed:

Jun. 13, 2022
Applicants:

International Business Machines Corporation, Armonk, NY (US);

Rensselaer Polytechnic Institute, Troy, NY (US);

Inventors:

Pin-Yu Chen, White Plains, NY (US);

Tejaswini Pedapati, White Plains, NY (US);

Bo Wu, Cambridge, MA (US);

Chuang Gan, Cambridge, MA (US);

Chunheng Jiang, Troy, NY (US);

Jianxi Gao, Niskayuna, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06N 3/096 (2023.01); G06N 3/08 (2023.01);
U.S. Cl.
CPC ...
G06N 3/096 (2023.01); G06N 3/08 (2013.01);
Abstract

An output layer is removed from a pre-trained neural network model and a neural capacitance probe unit with multiple layers is incorporated on top of one or more bottom layers of the pre-trained neural network model. The neural capacitance probe unit is randomly initialized and a modified neural network model is trained by fine-tuning the one or more bottom layers on a target dataset for a maximum number of epochs, the modified neural network model comprising the neural capacitance probe unit incorporated with multiple layers on top of the one or more bottom layers of the pre-trained neural network model. An adjacency matrix is obtained from the initialized neural capacitance probe unit and a neural capacitance metric is computed using the adjacency matrix. An active model is selected using the neural capacitance metric and a machine learning system is configured using the active model.


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