The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Jun. 30, 2020
Applicant:
Oji Holdings Corporation, Tokyo, JP;
Inventors:
Kazuyo Morita, Tokyo, JP;
Kimiko Hattori, Tokyo, JP;
Assignee:
Oji Holdings Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/00 (2006.01); G03F 7/012 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70625 (2013.01); G03F 7/0045 (2013.01); G03F 7/0125 (2013.01); G03F 7/0397 (2013.01); G03F 7/70125 (2013.01);
Abstract
It is an object of the present invention to provide a method of forming a high-contrast fine pattern onto a resist film. The present invention relates to a pattern forming method, comprising; applying a resist material onto a substrate to form a resist film, introducing a metal into the resist film, exposing, and developing. In addition, the present invention also relates to a resist material and a pattern forming apparatus.