The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Mar. 30, 2023
Zhengzhou Research Institute for Abrasives & Grinding Co., Ltd., Henan, CN;
Xiaolei Wu, Henan, CN;
Ning Yan, Henan, CN;
Shuai Xu, Henan, CN;
Yanjun Zhao, Henan, CN;
Junyong Shao, Henan, CN;
Wentao Zhou, Henan, CN;
Jiong Zhao, Henan, CN;
Bolun Cao, Henan, CN;
Hui Liu, Henan, CN;
Hongxing Pan, Henan, CN;
ZHENGZHOU RESEARCH INSTITUTE FOR ABRASIVES & GRINDING CO., LTD., Zhengzhou, CN;
Abstract
MPCVD device comprises deposition platform, substrate platform, lifting platform, microwave quartz window, upper cover plate, baseplate, pressure sensors, composite windows, thickness measuring device, visual device, temperature measuring device, plasma diagnostic device, vacuum sealing ring and microwave shielding sealing ring. Reaction cavity is formed by upper cover plate and baseplate, and inlet hole is arranged on top of upper cover plate, while exhaust hole is arranged on baseplate; microwave quartz window is annular shaped and arranged between deposition platform and baseplate, and reaction cavity is isolated from air outside by microwave quartz window; lifting platform is provided with vacuum channel and cooling channel therein; vacuum cavity, which is communicated with vacuum channel, is formed by lower surface of substrate platform and upper surface of lifting platform; and pressure sensor for monitoring gas pressure is arranged in vacuum cavity.