The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Jun. 19, 2023
Applicant:
Evonik Operations Gmbh, Essen, DE;
Inventors:
Alexandra Trambitas, Alzenau, DE;
Jochen Kleinen, Heinsberg, DE;
Jakob Müller, Haltern am See, DE;
Monica Desiree Van Logchem, PA Zevenbergen, NL;
David Voigtländer, Duesseldorf, DE;
Assignee:
Evonik Operations GmbH, Essen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 1/83 (2006.01); C11D 1/66 (2006.01); C11D 3/00 (2006.01); C11D 3/20 (2006.01); C11D 3/37 (2006.01); C11D 3/386 (2006.01);
U.S. Cl.
CPC ...
C11D 1/662 (2013.01); C11D 1/83 (2013.01); C11D 3/0036 (2013.01); C11D 3/2093 (2013.01); C11D 3/3707 (2013.01); C11D 3/38627 (2013.01); C11D 2111/12 (2024.01);
Abstract
Compositions having at least one biosurfactant and at least one persicomycin. The at least one biosurfactant is selected from the group consisting of rhamnolipids, glucolipids and sophorolipids. The compositions optionally have at least one enzyme, at least one non-biosurfactant and/or at least one selected from the group consisting of an anti-redeposition polymer and a soil release polymer. The compositions clean surfaces of an article in a process for cleaning said article.