The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Jan. 13, 2021
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventor:
Hitoshi Maruyama, Annaka, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/14 (2006.01); C08G 77/42 (2006.01); C08G 77/52 (2006.01); C08L 63/04 (2006.01); G03F 7/075 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C08G 77/14 (2013.01); C08G 77/42 (2013.01); C08G 77/52 (2013.01); C08L 63/04 (2013.01); G03F 7/0757 (2013.01); H01L 21/02126 (2013.01); H01L 21/02216 (2013.01);
Abstract
Provided is a photosensitive resin composition that includes: a silicone resin (A) having an epoxy group and/or a phenolic hydroxyl group; an alkyl phenol novolac resin (B) indicated by formula (B); and a photoacid generator (C). (In the formula, Ris a C1-9 saturated hydrocarbyl group. Ris a C10-25 saturated hydrocarbyl group. nand nare numbers that fulfil 0≤n<1, 0<n≤1, and n+n=1. mrepresents an integer from 0 to 3 and mrepresents an integer from 1 to 3.)
Maruyama, Hitoshi. (2025). Photosensitive resin composition, photosensitive resin coating, photosensitive dry film, pattern formation method (U.S. Patent No. 12448485). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12448485
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile