The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2025
Filed:
Sep. 26, 2018
Applied Materials, Inc., Santa Clara, CA (US);
Kun Xu, Sunol, CA (US);
David Maxwell Gage, Sunnyvale, CA (US);
Harry Q. Lee, Los Altos, CA (US);
Denis Anatolyevich Ivanov, St. Petersburg, RU;
Hassan G. Iravani, Sunnyvale, CA (US);
Doyle E. Bennett, Santa Clara, CA (US);
Kiran Lall Shrestha, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of compensating for a contribution of conductivity of the semiconductor wafer to a measured trace by an in-situ electromagnetic induction monitoring system includes storing or generating a modified reference trace. The modified reference trace represents measurements of a bare doped reference semiconductor wafer by an in-situ electromagnetic induction monitoring system as modified by a neutral network. The substrate is monitored with an in-situ electromagnetic induction monitoring system to generate a measured trace that depends on a thickness of the conductive layer, and at least a portion of the measured trace is applied to a neural network to generate a modified measured trace. An adjusted trace is generated, including subtracting the modified reference trace from the modified measured trace.