The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
Jun. 24, 2021
Beijing Boe Technology Development Co., Ltd., Beijing, CN;
Boe Technology Group Co., Ltd., Beijing, CN;
Zhuo Chen, Beijing, CN;
Beijing BOE Technology Development Co., Ltd., Beijing, CN;
Abstract
A manufacturing method of a patterned quantum dot light-emitting layer includes: forming a sacrificial layer on a side of a base substrate, wherein the sacrificial layer includes a first component and a second component mixed in the first component; forming a patterned photoresist layer on a side of the sacrificial layer facing away from the base substrate; etching the sacrificial layer by taking the patterned photoresist layer as a mask to form a patterned sacrificial layer; forming a quantum dot film layer on a side of the photoresist layer facing away from the sacrificial layer; making the second component decompose under the preset condition to produce the bubbles, to make the first component form the porous structure; and forming the patterned quantum dot light-emitting layer by removing the photoresist layer, the sacrificial layer and the quantum dot film layer attached to the sacrificial layer, by dissolution via a solvent.