The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2025

Filed:

Jan. 24, 2023
Applicant:

Magnolia White Corporation, Tokyo, JP;

Inventor:

Yuko Matsumoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 71/00 (2023.01); H10K 59/12 (2023.01); H10K 59/122 (2023.01); H10K 59/35 (2023.01); H10K 59/80 (2023.01); H10K 71/20 (2023.01);
U.S. Cl.
CPC ...
H10K 71/00 (2023.02); H10K 59/1201 (2023.02); H10K 59/122 (2023.02); H10K 59/873 (2023.02); H10K 71/231 (2023.02); H10K 59/35 (2023.02); H10K 59/353 (2023.02); H10K 59/871 (2023.02);
Abstract

According to one embodiment, a method of manufacturing a display device includes forming a first organic layer covering a lower electrode and a second organic layer on an upper portion of a partition, forming a first upper electrode and a second upper electrode, forming a first transparent layer and a second transparent layer, forming a first inorganic layer and a second inorganic layer, forming a sealing layer on the first inorganic layer and the second inorganic layer, forming a resist covering the sealing layer directly above the lower electrode and covering a part of the sealing layer directly above the partition, performing dry etching using the resist as a mask, and performing wet etching by an acidic solution using the resist as a mask.


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