The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2025

Filed:

Sep. 27, 2022
Applicant:

Ckd Corporation, Aichi, JP;

Inventors:

Kazuyoshi Kikuchi, Aichi, JP;

Takayuki Shinyama, Aichi, JP;

Tsuyoshi Ohyama, Aichi, JP;

Norihiko Sakaida, Aichi, JP;

Assignee:

CKD Corporation, Aichi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 3/34 (2006.01); B23K 1/00 (2006.01); B41F 15/08 (2006.01); B41F 15/36 (2006.01); B41F 33/00 (2006.01); B41F 33/16 (2006.01); G01N 21/89 (2006.01); G01N 21/956 (2006.01); H05K 1/02 (2006.01);
U.S. Cl.
CPC ...
H05K 3/3452 (2013.01); B23K 1/00 (2013.01); B41F 15/08 (2013.01); B41F 15/36 (2013.01); B41F 33/0027 (2013.01); B41F 33/0036 (2013.01); B41F 33/0081 (2013.01); B41F 33/16 (2013.01); G01N 21/8914 (2013.01); G01N 21/95607 (2013.01); H05K 1/0269 (2013.01); H05K 3/3485 (2020.08); B41P 2215/114 (2013.01); G01N 2021/8918 (2013.01); G01N 2021/95646 (2013.01); H05K 2203/163 (2013.01); H05K 2203/166 (2013.01);
Abstract

A screen mask inspection device inspects a screen mask including a screen opening that forms a printing pattern, and includes: an inspection control device that detects solder position information of a solder paste printed on a substrate via the screen opening, and based on the solder position information, determines whether a quality of printing using the screen mask is good or bad, the solder position information being based on an amount of positional misalignment of the solder paste actually printed on the substrate relative to a predetermined reference position.


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