The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
Apr. 01, 2022
Applicant:
Tae Technologies, Inc., Foothill Ranch, CA (US);
Inventors:
Daniel Marshall, Chandler, AZ (US);
Anatoly Muchnikov, Mission Viejo, CA (US);
Sergey Vdovichev, Foothill Ranch, CA (US);
Assignee:
TAE Technologies, Inc., Foothill Ranch, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 6/00 (2006.01); H05H 3/06 (2006.01);
U.S. Cl.
CPC ...
H05H 6/00 (2013.01); H05H 3/06 (2013.01);
Abstract
Passivation regions and device configurations are described herein. The passivation regions can be configured to seal against diffusion of an objective material from an underlying region into and/or through the passivation region. The passivation regions can also be configured to seal against diffusion of an externally sourced or ambient substance into and/or through the passivation region towards the underlying region.