The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
Aug. 06, 2021
Applicant:
Tokuyama Corporation, Yamaguchi, JP;
Inventors:
Takafumi Shimoda, Yamaguchi, JP;
Yuki Kikkawa, Yamaguchi, JP;
Tomoaki Sato, Yamaguchi, JP;
Takayuki Negishi, Yamaguchi, JP;
Assignee:
TOKUYAMA CORPORATION, Yamaguchi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01L 21/32134 (2013.01);
Abstract
Provided is a treatment liquid for treating a semiconductor wafer in a semiconductor forming process, the treatment liquid containing (A) a hypobromite ion, (B) a pH buffer, and (C) an onium ion represented by formula (1): (wherein R, R, R, and Reach independently denote an alkyl group having carbon number from 1 to 25,)