The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2025

Filed:

Oct. 13, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Lukasz G. Cmielowski, Cracow, PL;

Szymon Kucharczyk, Cracow, PL;

Dorota Lączak, Mielec, PL;

Daniel Jakub Ryszka, Cracow, PL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06N 20/00 (2019.01); G06F 18/211 (2023.01); G06F 18/2113 (2023.01); G06F 18/214 (2023.01); G06F 18/40 (2023.01); G06N 3/08 (2023.01);
U.S. Cl.
CPC ...
G06F 18/211 (2023.01); G06F 18/40 (2023.01); G06N 20/00 (2019.01);
Abstract

The present disclosure relates to a computer-implemented method for generating a machine learning module (ML-module). The method comprises providing training data comprising a first set of data corresponding to a first feature and a second set of data corresponding to a second feature and generating a further set of data, wherein the further set of data corresponds to a further feature. A first correlation metric as a measure of a correlation between a selected feature of the first and the second feature and the further feature is calculated. Furthermore, a bias metric is determined indicating a strength of a bias of the trained ML-module towards a first subset of values of the further feature or a second subset of values of the further feature if the first correlation metric is greater than a first threshold. If the bias metric satisfies the bias constraint, then the ML-module is released for usage.


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