The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
Sep. 27, 2022
Method for inspecting photosensitive composition and method for producing photosensitive composition
Fujifilm Corporation, Tokyo, JP;
Naoya Iguchi, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided are a method for inspecting a photosensitive composition, the method being able to more accurately evaluate photosensitive compositions produced at different times and including the same materials, and a method for producing a photosensitive composition. The method for inspecting a photosensitive composition includes a first step of performing exposure treatment, heat treatment, and development treatment in this order on a dummy substrate including a first photosensitive composition layer formed using a first photosensitive composition; a second step of performing exposure treatment, heat treatment, and development treatment under the same conditions as in the first step on a first evaluation substrate including the first photosensitive composition layer to form a pattern; a third step of performing exposure treatment, heat treatment, and development treatment under the same conditions as in the first step on a second evaluation substrate including a second photosensitive composition layer formed using a second photosensitive composition to form a pattern; and a fourth step of determining whether a difference between a dimension of the pattern obtained in the second step and a dimension of the pattern obtained in the third step is within an acceptable range. The first photosensitive composition and the second photosensitive composition are compositions including the same materials and produced in different lots.