The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
May. 25, 2022
Apple Inc., Cupertino, CA (US);
Yifei Wang, Sunnyvale, CA (US);
Xiaoyong Fu, Fremont, CA (US);
Wencong Zhu, Foster City, CA (US);
Xianwei Zhao, Cupertino, CA (US);
Francesco Aieta, Alameda, CA (US);
Zhujun Shi, San Jose, CA (US);
Hyungryul Choi, San Jose, CA (US);
Zhenbin Ge, San Jose, CA (US);
Shigeto Kobori, Tokyo, JP;
Yoshitaka Matsui, Yokohama, JP;
Yukinori Asakawa, Saitama, JP;
Jun Xie, San Jose, CA (US);
Apple Inc., Cupertino, CA (US);
Abstract
An electronic device may have a display system. The display system may include a waveguide, an input coupler, and a surface relief grating (SRG) structure. There are various ways to form a SRG structure. In one example, nanoimprinting may be performed on a low-index resin to form a mold for a subsequent deposition of high-index material. The high-index material conforms to the mold to form ridges for the SRG structure. A reusable mold may be formed with a plurality of ridges on a flexible substrate and coated by an anti-stick coating. The reusable mold may be coated with a high-index material that is attached to a glass substrate and cured to form a wafer-level SRG structure with high-index ridges on a glass substrate. The wafer-level SRG structure is subsequently diced. SRG structures may also be formed that include varying trough thicknesses, varying ridge thicknesses, and/or a sloped substrate.