The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
Aug. 25, 2021
Applicant:
Dh Technologies Development Pte. Ltd., Singapore, SG;
Inventor:
Ingrid Cruzado-Park, Pomona, CA (US);
Assignee:
DH Technologies Development Pte. Ltd., Singapore, SG;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/447 (2006.01); C08K 5/09 (2006.01); C08L 71/02 (2006.01);
U.S. Cl.
CPC ...
G01N 27/44747 (2013.01); C08K 5/09 (2013.01); C08L 71/02 (2013.01); G01N 27/44795 (2013.01);
Abstract
The presently claimed and described technology is directed to an acidic high polymer composition comprising about 1.0% (w/v) polymer and about 4% (v/v) carboxylic acid. The acid high polymer composition may be used as a neutral capillary storage or conditioning solution or in a method of improving capillary isoelectric focusing (cIEF) robustness or performance. The technology is also directed to a kit comprising an acidic high polymer composition, at least one stabilizer, an anolyte, and a catholyte.