The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
Oct. 03, 2023
Applicant:
Contemporary Amperex Technology (Hong Kong) Limited, Hong Kong, CN;
Inventors:
Liangjie Yan, Ningde, CN;
Xing Wang, Ningde, CN;
Assignee:
CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITED, Hong Kong, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/02 (2006.01); G01N 23/20025 (2018.01); H01M 10/42 (2006.01);
U.S. Cl.
CPC ...
G01N 23/02 (2013.01); G01N 23/20025 (2013.01); H01M 10/4285 (2013.01); G01N 2223/03 (2013.01);
Abstract
A measurement method includes determining a measured mass parameter of a workpiece being measured based on radiation intensity of rays that have passed through the workpiece being measured; and correcting the measured mass parameter by using a displacement curve function of the workpiece being measured in a measurement environment, to obtain the corrected mass parameter of the workpiece being measured, where the displacement curve function is used to characterize influence of environmental factors on radiation in the measurement environment.