The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
Jul. 18, 2022
City University of Hong Kong, Kowloon, HK;
City University of Hong Kong, Kowloon, HK;
Abstract
The present invention discloses a unidirectional moisturizing nanofiber facial mask substrate with asymmetric wettability and preparation thereof. The preparation includes: preparing a superhydrophilic electrospun fiber membrane on a substrate by electrospinning; preparing a hydrophobic electrospun fiber membrane by electrospinning on a lateral surface of the superhydrophilic electrospun fiber membrane away from the substrate to form a double-layered membrane; and removing the substrate, and drying the double-layered membrane to obtain the asymmetric unidirectional moisturizing facial mask substrate with one side being superhydrophilic and the other side being hydrophobic. The superhydrophilic layer can absorb a nutrient solution and be applied to the skin surface, while the hydrophobic layer can keep itself dry, reduce the consumption of the nutrient solution and inhibit volatilization of the nutrient solution. The process is simple, uses readily available materials, and is non-toxic, environmentally friendly, and low-cost, thus solving several key problems with current commercial facial mask substrates.