The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2025
Filed:
Apr. 07, 2023
Composition for semiconductor processing and polishing method of semiconductor device using the same
SK Enpulse Co., Ltd., Pyeongtaek-si, KR;
Deok Su Han, Seoul, KR;
Seung Chul Hong, Seoul, KR;
Han Teo Park, Seoul, KR;
Hwan Chul Kim, Seoul, KR;
Hyeong Ju Lee, Seoul, KR;
SK enpulse Co., Ltd., Pyeongtaek-si, KR;
Abstract
A composition for semiconductor processing, includes abrasive particles surface-modified with an amino silane-based compound; a copper erosion inhibitor, including an azole-based compound; a copper surface protectant, including a compound having a betaine group and a salicylic group or a derivative thereof; and a surfactant, including fluorine in a molecule thereof. A surface of the surface-modified abrasive particles comprises an amino silane group.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile