The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2025

Filed:

Dec. 20, 2022
Applicant:

Imec Vzw, Leuven, BE;

Inventor:

Jan Van Houdt, Bekkevoort, BE;

Assignee:

IMEC VZW, Leuven, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 64/00 (2025.01); H10B 51/30 (2023.01); H10D 30/01 (2025.01); H10D 30/69 (2025.01); H10D 64/01 (2025.01); H10D 64/27 (2025.01);
U.S. Cl.
CPC ...
H10D 64/511 (2025.01); H10B 51/30 (2023.02); H10D 30/0415 (2025.01); H10D 30/701 (2025.01); H10D 64/033 (2025.01);
Abstract

The present disclosure provides a ferroelectric field-effect transistor comprising: a substrate comprising a source region, a channel, and a drain region; a ferroelectric material arranged on a first portion of the channel and a portion of the drain region; a program gate arranged on the ferroelectric material and being at least coextensive with the first portion of the channel; a gate dielectric arranged on a portion of the source region and a second portion of the channel; and a select gate arranged on the gate dielectric and being at least coextensive with said portion of the source region and the second portion of the channel; wherein a well of the substrate extending under the whole channel has a uniform doping level.


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