The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
May. 08, 2019
Applicant:
Vestlandets Innovasjonsselskap As, Bergen, NO;
Inventor:
Justas Zalieckas, Bergen, NO;
Assignee:
VESTLANDETS INNOVASJONSSELSKAP AS, Bergen, NO;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/511 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32229 (2013.01); H01J 37/32192 (2013.01); H01J 37/32266 (2013.01); C23C 16/511 (2013.01); H01J 37/32238 (2013.01); H01J 37/32256 (2013.01);
Abstract
A large area microwave plasma chemical vapour deposition, LA MPCVD reactor apparatus and method for large area microwave chemical vapour deposition, comprising a reactor chamber adapted to provide a plasma region in an interior of the reactor chamber by electromagnetic energy at a first frequency, and a CRLH waveguide section adapted to operate with an infinite wavelength at the first frequency and having in a wall a coupler means arranged to couple electromagnetic energy from an interior of the CRLH waveguide section to the interior of the reactor chamber.