The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2025

Filed:

Apr. 14, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Seohyung Lee, Yongin-si, KR;

Dongwook Lee, Suwon-si, KR;

Changbeom Park, Seoul, KR;

Byung In Yoo, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06V 10/82 (2022.01); G06N 3/08 (2023.01); G06V 10/40 (2022.01);
U.S. Cl.
CPC ...
G06V 10/82 (2022.01); G06N 3/08 (2013.01); G06V 10/40 (2022.01);
Abstract

A method with self-attention includes: obtaining a three-dimensional (3D) feature map; generating 3D query data and 3D key data by performing a convolution operation based on the 3D feature map; generating two-dimensional (2D) vertical data based on a vertical projection of the 3D query data and the 3D key data; generating 2D horizontal data based on a horizontal projection of the 3D query data and the 3D key data; determining an intermediate attention result through a multiplication based on the 2D vertical data and the 2D horizontal data; and determining a final attention result through a multiplication based on the intermediate attention result and the 3D feature map.


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