The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2025

Filed:

Jun. 08, 2023
Applicant:

Tencent Technology (Shenzhen) Company Limited, Shenzhen, CN;

Inventor:

Fei Xia, Shenzhen, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 17/00 (2006.01); G06V 10/60 (2022.01);
U.S. Cl.
CPC ...
G06T 17/00 (2013.01); G06V 10/60 (2022.01);
Abstract

The present disclosure provides a method for processing visibility data of a three-dimensional model performed by a computer device. The method includes: obtaining original values of visibility data of a plurality of sampling points of the three-dimensional model; determining visibility data of a plurality of vertexes of the three-dimensional model based on a first error function measuring differences between recovery values of the visibility data of the sampling points from interpolation of the visibility data of the vertexes of the three-dimensional model and the original values of the visibility data of the sampling points and change rates of the recovery values of the visibility data of the sampling points; and storing the visibility data of each vertex of the three-dimensional model. This method reduces the space for storing the visibility data, relieves the pressure of storing the visibility data, and improves the efficiency of rendering the three-dimensional model.


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