The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Aug. 13, 2024
Dell Products L.p., Hopkinton, MA (US);
Dmitry Nikolayevich Tylik, Westborough, MA (US);
Vasudevan Subramanian, Chapel Hill, NC (US);
Girish Sheelvant, Hopkinton, MA (US);
Dell Products L.P., Hopkinton, MA (US);
Abstract
Techniques can include: establishing synchronous replication configurations between first and second sites for a group of stretched resources and a stretched resource; and performing processing that adds the stretched resource to the group. While both the group and stretched resource are in an active-active state and replicating data, existing replication session objects associated with stretched resource on both sites can be deleted while retaining remaining portions of layered services stacks corresponding to the stretched resource on both sites. A first remaining portion can be added to a first replication session object corresponding to the group on the first site. A second remaining portion can be added to a second replication session object corresponding to the group on the second site. Even though the existing replication session objects associated with the stretched resource may be deleted, the existing configuration corresponding to the stretched object can be retained.