The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Apr. 13, 2023
Canon Kabushiki Kaisha, Tokyo, JP;
Kazuhiro Sato, Tochigi, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A lithography device includes: a pattern forming unit that forms a pattern in a shot region on a substrate held by a substrate holding unit by using a pattern unit; an acquisition unit that acquires relationships among the amount of positional deviation of the substrate relative to the substrate holding unit, a holding force applied to at least a part of the substrate to hold the substrate, and an overlapping error between the substrate and the pattern unit; a measurement unit that measures the amount of positional deviation of the substrate relative to the substrate holding unit; and a control unit that controls the holding force to reduce the overlapping error between the substrate and the pattern unit on the basis of the amount of positional deviation measured by the measuring unit and the relationships acquired by the acquisition unit.