The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Sep. 04, 2023
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Seungchul Lee, Suwon si, KR;
Younghoon Sohn, Suwon si, KR;
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); G01N 23/207 (2018.01); G01N 23/223 (2006.01);
U.S. Cl.
CPC ...
G01N 23/223 (2013.01); G01N 23/207 (2013.01); H01L 22/12 (2013.01); G01N 2223/6116 (2013.01);
Abstract
An apparatus for measuring a thickness of a metal layer includes a light source unit configured to generate X-rays, a detection unit configured to detect the X-rays diffracted from a specimen, and a processor configured to measure the thickness of the metal layer of the specimen using an intensity of the X-rays diffracted from the specimen.
Lee, Seungchul. (2025). Apparatus and method for measuring a layer of a semiconductor device using x-ray diffraction (U.S. Patent No. 12436122). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12436122
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile