The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2025

Filed:

Oct. 08, 2021
Applicant:

Sony Semiconductor Solutions Corporation, Kanagawa, JP;

Inventors:

Yoshitaka Miyatani, Tokyo, JP;

Tatsuji Ashitani, Kanagawa, JP;

Ryuta Okamoto, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/25 (2006.01); G01B 11/24 (2006.01); H04N 25/47 (2023.01); H04N 25/701 (2023.01);
U.S. Cl.
CPC ...
G01B 11/2518 (2013.01); G01B 11/24 (2013.01); G01B 11/2545 (2013.01); H04N 25/47 (2023.01); H04N 25/701 (2023.01);
Abstract

Shape measuring systems are disclosed. In one example, a shape measuring system includes a light source part with a light source, a waveform control lens, and a scan mechanism. It also includes light receiving parts that each include a light receiving lens on which reflected light reflected by the measurement target among measurement light from the light source part is incident, an EVS, which is an asynchronous imaging device that is a light receiving element, an event issuing part that detects an event on the basis of output data from the EVS and outputs event data, and a transmitting part that outputs the event data to the signal processing part. A signal processing part includes an unwanted signal removing part that removes an unwanted signal resulting from incidence of secondary reflected light, and a three-dimensional calculating part that calculates a three-dimensional shape of the measurement target.


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