The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Sep. 16, 2021
Applicant:
Ap Systems Inc., Hwaseong-Si, KR;
Inventors:
Pil Seong Jeong, Yongin-si, KR;
Sang Hyun Ji, Yongin-si, KR;
Chang Kyo Kim, Hwaseong-si, KR;
Dong Sik Kim, Suwon-si, KR;
Assignee:
AP SYSTEMS INC., , KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/50 (2013.01); C23C 16/45559 (2013.01); C23C 16/52 (2013.01); H01J 37/32 (2013.01); H01J 37/32229 (2013.01);
Abstract
Provided are an apparatus and method for forming a thin film. The apparatus for forming a thin film include a chamber configured to define a substrate processing space therein, a substrate support part connected to the chamber to support a substrate inside the chamber, a heat source part connected to the chamber to face the substrate support part, and a plasma generation part connected to the chamber to supply radicals between the substrate support part and the heat source part at at least two points.