The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2025
Filed:
Oct. 17, 2019
Applicant:
Lpe S.p.a., Baranzate, IT;
Inventors:
Assignee:
LPE S.P.A., Baranzate, IT;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/458 (2006.01); C23C 16/46 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4586 (2013.01); C23C 16/46 (2013.01);
Abstract
The reaction chamber (A) is used for a reactor for the deposition of semiconductor material on a substrate (); it extends in a longitudinal direction and comprises a reaction and deposition zone () which extends in the longitudinal direction; this zone () is defined by susceptor elements (A,B,C,A,B,) adapted to be heated by electromagnetic induction; a first susceptor element (A,B,C,A,B) is opposite to a substrate support element () of the chamber and has a hole () which extends in the longitudinal direction along its whole length; the first susceptor element (A,B,C,A,B) has a non-uniform cross section that depends on its longitudinal position.