The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2025

Filed:

Oct. 11, 2023
Applicant:

Institute of Process Engineering, Chinese Academy of Sciences, Beijing, CN;

Inventors:

Huiquan Li, Beijing, CN;

Ganyu Zhu, Beijing, CN;

Ziheng Meng, Beijing, CN;

Kun Yan, Beijing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01F 11/46 (2006.01);
U.S. Cl.
CPC ...
C01F 11/468 (2013.01);
Abstract

The present application provides a method for separating and purifying phosphoric acid and phosphogypsum from a wet-process phosphoric acid slurry, and phosphoric acid and phosphogypsum prepared thereby. The method is beneficial for the dissociation, precipitation and separation of colloidal silicon and carbon impurities, such that the aim of in-situ removal and rapid separation of colloidal impurities to obtain the ore slurry, from which impurities have been removed, during a reaction process for outputting phosphogypsum is realized, and a low-impurity phosphoric acid product and phosphogypsum product can be obtained after the ore slurry, from which impurities have been removed, has been further treated.


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