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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12433925 B1

PDFFull Text
Date of Patent:
Oct. 07, 2025

Filed:

Jun. 22, 2021

Composition for photodynamic reaction containing extract ofas an effective ingredient, antimicrobial, antifungal and sterilization composition including the same, and sterilization method using the composition for photodynamic reaction

Applicant:

Korea Institute of Science and Technology, Seoul, KR;

Inventors:

Kyungsu Kang, Gangneung-si, KR;

Jae Young Kwon, Gangneung-si, KR;

Hak Cheol Kwon, Gangneung-si, KR;

Jin Chul Kim, Gangneung-si, KR;

Jin Soo Park, Gangneung-si, KR;

Ho Seong Hwang, Gangneung-si, KR;

Seemi Tasnim Alam, Gangneung-si, KR;

Assignee:

KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY, Seoul, KR;

Attorney:

Birch, Stewart, Kolasch & Birch, LLP

Primary Examiner:

Susan Hoffman

Int. Cl.
CPC ...
A61K 36/28 (2006.01); A01N 65/12 (2009.01); A23B 2/53 (2025.01); A23B 2/733 (2025.01); A23B 4/015 (2006.01); A23B 4/20 (2006.01); A23B 7/015 (2006.01); A23B 7/154 (2006.01); A61K 41/00 (2020.01); A61L 2/00 (2006.01); A61L 2/08 (2006.01); A61L 2/10 (2006.01); A61L 2/26 (2006.01); A61P 31/04 (2006.01); A61P 31/10 (2006.01); C02F 1/32 (2023.01); C02F 1/50 (2023.01); A61L 101/32 (2006.01);
U.S. Cl.
CPC ...
A61K 36/28 (2013.01); A01N 65/12 (2013.01); A23B 2/53 (2025.01); A23B 2/733 (2025.01); A23B 4/015 (2013.01); A23B 4/20 (2013.01); A23B 7/015 (2013.01); A23B 7/154 (2013.01); A61K 41/0057 (2013.01); A61L 2/0047 (2013.01); A61L 2/0052 (2013.01); A61L 2/0076 (2013.01); A61L 2/084 (2013.01); A61L 2/088 (2013.01); A61L 2/10 (2013.01); A61L 2/26 (2013.01); A61P 31/04 (2018.01); A61P 31/10 (2018.01); C02F 1/325 (2013.01); C02F 1/50 (2013.01); A23V 2002/00 (2013.01); A61K 2236/15 (2013.01); A61K 2236/17 (2013.01); A61K 2236/331 (2013.01); A61K 2236/333 (2013.01); A61L 2101/32 (2020.08); A61L 2202/11 (2013.01); A61L 2202/24 (2013.01); C02F 2201/3222 (2013.01); C02F 2303/04 (2013.01);
Abstract

Provided are methods of reducing and killing bacteria and fungi, and photodynamic treatment methods and sterilization methods using the methods of reducing and killing bacteria and fungi. The method of reducing and killing bacteria and fungi includes bringing a composition including aextract or a fraction thereof as an active ingredient into contact with cells or tissues of a subject and irradiating cells or tissues of a subject in contact with the composition with an absorbable wavelength of excitation light.

Find Patent Forward Citations

Kang, Kyungsu. (2025). Composition for photodynamic reaction containing extract ofas an effective ingredient, antimicrobial, antifungal and sterilization composition including the same, and sterilization method using the composition for photodynamic reaction (U.S. Patent No. 12433925). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12433925

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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