The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2025
Filed:
Jul. 08, 2022
Applicant:
Tae Technologies, Inc., Foothill Ranch, CA (US);
Inventors:
Hiroshi Gota, Irvine, CA (US);
Tashiki Tajima, Foothill Ranch, CA (US);
Assignee:
TAE TECHNOLOGIES, INC., Foothill Ranch, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/14 (2006.01); G21B 1/11 (2006.01);
U.S. Cl.
CPC ...
H05H 1/14 (2013.01); G21B 1/11 (2013.01);
Abstract
A high performance field reversed configuration (FRC) system includes a central confinement chamber, two divertor chambers coupled to the chamber, and two diametrically opposed spheromak injectors coupled to the divertor chambers. A magnetic system includes quasi-dc coils axially positioned along the FRC system components.