The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

May. 26, 2022
Applicant:

Advanced Micro-fabrication Equipment Inc. China, Shanghai, CN;

Inventors:

Zhihao Wang, Shanghai, CN;

Lei Wu, Shanghai, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32642 (2013.01); H01J 37/32174 (2013.01); H01J 37/32568 (2013.01); H01J 2237/2006 (2013.01);
Abstract

Disclosed are a plasma processing device and a retractable sealing part thereof. The retractable sealing part is arranged in or near a radio-frequency circuit of the plasma processing device. The retractable sealing part includes a bellows assembly having a first end and a second end. Isolation rings are added to an upper part and a lower part of the bellows assembly to weaken longitudinal radio-frequency coupling. Metal sleeves are added to an inner side and an outer side of the bellows assembly to shield transverse radio-frequency coupling. The present disclosure effectively shields radio-frequency coupling on the basis of maintaining the functions of vacuum isolation and extension and retraction of the retractable sealing part, thereby obtaining the stable radio-frequency circuit and etching rate.


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