The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Jun. 15, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Aaron P. Webb, Austin, TX (US);

Krag R. Senior, Austin, TX (US);

Chris Czajka, Dripping Springs, TX (US);

Charles T. Carlson, Cedar Park, TX (US);

Jason M. Schaller, Austin, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/30 (2006.01); H01J 37/317 (2006.01); H05H 9/04 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3007 (2013.01); H01J 37/3171 (2013.01); H05H 9/042 (2013.01); H01J 2237/08 (2013.01); H05H 2277/12 (2013.01);
Abstract

An ion implantation system including an ion source for generating an ion beam, an end station for holding a substrate to be implanted by the ion beam, and a linear accelerator disposed between the ion source and the end station and adapted to accelerate the ion beam, the linear accelerator comprising at least one acceleration stage including a resonator coil coupled to a drift tube assembly, the drift tube assembly including a first drift tube coupled to a first end of a first insulting rod via interference fit, a second drift tube coupled to a first end of a second insulting rod via interference fit, and a mounting bracket coupled to a second end of the first insulting rod and to a second end of the second insulting rod via interference fit.


Find Patent Forward Citations

Loading…