The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

May. 18, 2022
Applicant:

Honor Device Co., Ltd., Shenzhen, CN;

Inventors:

Wei Zhang, Shenzhen, CN;

Fuzheng Yang, Shenzhen, CN;

Yuxin Du, Shenzhen, CN;

Jiarun Song, Shenzhen, CN;

Assignee:

HONOR DEVICE CO., LTD., Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 3/067 (2024.01);
U.S. Cl.
CPC ...
G06T 3/067 (2024.01);
Abstract

The present invention discloses a method and an apparatus for 2D regularized planar projection of a point cloud. The method includes: obtaining original point cloud data; initializing a planar structure of 2D projection of the point cloud; calculating horizontal azimuth information of the point cloud based on the original point cloud data; and determining a mapping relationship between the original point cloud data and the planar structure of 2D projection based on the horizontal azimuth information, to obtain a planar structure of 2D regularized projection of the point cloud. In the present invention, a large-scale point cloud may be projected to a 2D regularized planar structure without 2D local search. Therefore, complexity of an algorithm can be reduced, time spent on 2D regularized planar projection of the point cloud can be reduced, and algorithm performance can be improved.


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