The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2025
Filed:
Feb. 17, 2023
Applicant:
E Ink Holdings Inc., Hsinchu, TW;
Inventor:
Chien-Hsing Chang, Hsinchu, TW;
Assignee:
E Ink Holdings Inc., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G02B 1/11 (2015.01);
U.S. Cl.
CPC ...
G03F 7/0005 (2013.01); G02B 1/11 (2013.01);
Abstract
An anti-glare layer and a manufacturing method thereof are provided. The manufacturing method of the anti-glare layer includes providing a substrate, coating an anti-glare material layer on the substrate, and performing a photolithography process on the anti-glare material layer through a gray-scale mask to form the anti-glare layer. The anti-glare layer includes multiple protrusion portions with different heights.
Quick Actions:
Chang, Chien-Hsing. (2025). Anti-glare layer and manufacturing method thereof (U.S. Patent No. 12429765). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12429765
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile