The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Aug. 16, 2023
Applicant:

Thorlabs, Inc., Newton, NJ (US);

Inventors:

Longfei Ye, Columbia, SC (US);

Ryan Joseph Priore, Wexford, PA (US);

Bill Donovan, Montclair, NJ (US);

Alex Cable, Newton, NJ (US);

Assignee:

Thorlabs, Inc., Newtown, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/14 (2006.01); G02B 1/111 (2015.01); G02B 1/118 (2015.01);
U.S. Cl.
CPC ...
G02B 1/111 (2013.01); B05D 3/148 (2013.01); G02B 1/118 (2013.01);
Abstract

In a method of producing an anti-reflective surface, instead of etching subwavelength structures directly onto the substrate, a thin film layer of topcoat is deposited onto the surface of the substrate, and the anti-reflective surface is created by etching the structures into the topcoat. Because the thin film can be applied to substrates made of a large number of different materials, only common etching recipes need to be developed for a few thin film materials. The present method overcomes the shortcoming that existing methods of etching structures directly on a substrate would require a different etching recipe for each substrate made of a different material.


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