The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Nov. 16, 2020
Applicant:

Semsysco Gmbh, Salzburg, AT;

Inventors:

Andreas Gleissner, Döbriach, AT;

Harald Modl, Radenthein, AT;

Assignee:

SEMSYSCO GMBH, Salzburg, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 17/04 (2006.01); C25D 17/00 (2006.01); C25D 17/06 (2006.01);
U.S. Cl.
CPC ...
C25D 17/04 (2013.01); C25D 17/007 (2013.01); C25D 17/06 (2013.01);
Abstract

The present disclosure relates to a distribution system for a process fluid for chemical and/or electrolytic surface treatment of a substrate, a device for chemical and/or electrolytic surface treatment of a substrate in a process fluid, a use of the distribution system, and a method for manufacturing the distribution system. The distribution system comprises: a first distribution body, a substitute body, and a framework. The first distribution body is configured to direct a flow of the process fluid and/or an electrical current to the substrate. The first distribution body and the substitute body are arranged to insert the substrate between them. The framework is configured to mount the first distribution body and the substitute body relative to each other. The framework is further configured to form, together with the first distribution body and the substitute body, a casing surrounding the substrate.


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