The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

May. 26, 2022
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventor:

Ankit Kimtee, Phoenix, AZ (US);

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); B01D 45/08 (2006.01); B01J 4/00 (2006.01); B01J 19/00 (2006.01); B08B 15/00 (2006.01); B08B 15/04 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); B01D 45/08 (2013.01); B01J 4/001 (2013.01); B01J 19/006 (2013.01); B08B 15/00 (2013.01); B08B 15/04 (2013.01); H01L 21/67017 (2013.01);
Abstract

A contaminant trap system of a reactor system may include a baffle plate stack including at least one baffle plate having an aperture spanning through a baffle plate body of the baffle plate, and a body portion; and at least one complementary baffle plate having a complementary aperture spanning through a complementary baffle plate body of the complementary baffle plate, and a complementary body portion. The at least one baffle plate and the at least one complementary baffle plate may be disposed in a baffle plate order between a first end and a second end of the baffle plate stack in which the baffle plates alternate with the complementary baffle plates, such that no two baffle plates or no two complementary baffle plates are adjacent in the baffle plate order. The at least one baffle plate may include a sintered material.


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