The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2025
Filed:
Jan. 28, 2021
Applicant:
Denka Company Limited, Tokyo, JP;
Inventors:
Assignee:
DENKA COMPANY LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 11/02 (2006.01); C04B 35/117 (2006.01); C04B 35/14 (2006.01); C04B 35/443 (2006.01); C09K 11/77 (2006.01); H10H 20/825 (2025.01); H10H 20/851 (2025.01);
U.S. Cl.
CPC ...
C09K 11/02 (2013.01); C04B 35/117 (2013.01); C04B 35/14 (2013.01); C04B 35/443 (2013.01); C09K 11/77348 (2021.01); H10H 20/825 (2025.01); H10H 20/8512 (2025.01); H10H 20/8514 (2025.01); C04B 2235/3217 (2013.01); C04B 2235/3218 (2013.01); C04B 2235/3222 (2013.01); C04B 2235/3869 (2013.01); C04B 2235/5436 (2013.01); C04B 2235/786 (2013.01); C04B 2235/9646 (2013.01); H10H 20/8511 (2025.01);
Abstract
A phosphor plate includes a plate-like composite including a base material and an α-type sialon phosphor present in the base material, in which, in an X-ray diffraction analysis pattern using a Cu-Kα ray, in a case in which peak intensity corresponding to the α-type sialon phosphor having a diffraction angle 2θ in a range of 30.2° or more and 30.4° or less is defined as Iand peak intensity of a peak having a diffraction angle 2θ in a range of 26.6° or more and 26.8° or less is defined as I, I, and Isatisfy 0<I/I≤10.