The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2025
Filed:
Jul. 27, 2020
Compagnie Generale Des Etablissements Michelin, Clermont-Ferrand, FR;
Centre National DE LA Recherche Scientifique, Paris, FR;
Ecole Superieure DE Chimie Physique Electronique DE Lyon, Villeurbanne, FR;
Universite Claude Bernard Lyon 1, Villeurbanne, FR;
Emma Moreso, Clermont-Ferrand, FR;
Julien Thuilliez, Clermont-Ferrand, FR;
François Jean-Baptiste-Dit-Dominique, Clermont-Ferrand, FR;
Christophe Boisson, Tramoyes, FR;
Franck D'agosto, Genas, FR;
Nicolas Baulu, Genas, FR;
Damien Montarnal, Ruy Montceau, FR;
COMPAGNIE GENERAL DES ETABLISSMENTS MICHELIN, Clermont-Ferrand, FR;
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, Paris, FR;
ECOLE SUPERIEURE DE CHIMIE PHYSIQUE ELECTRONIQUE DE LYON, Villeurbanne, FR;
UNIVERSITE CLAUDE BERNAD LYON 1, Vitieurbanne, FR;
Abstract
A diblock polymer composed of a first block and a second block is provided. The first block is a statistical copolymer comprising units of a 1,3-diene and more than 50 mol % of ethylene units. The second block is a polyethylene with a melting point above 90° C. and a number-average molar mass greater than or equal to 2000 g/mol and less than or equal to 10 000 g/mol. Such a diblock polymer has improved rheology compared to a statistical copolymer of the same microstructure and of the same macrostructure as the first block of the diblock polymer.