The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Feb. 11, 2022
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Timothy Brian Stachowiak, Austin, TX (US);

Fen Wan, Austin, TX (US);

Weijun Liu, Cedar Park, TX (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 120/18 (2006.01); C09D 11/101 (2014.01); C09D 11/38 (2014.01); G03F 7/028 (2006.01);
U.S. Cl.
CPC ...
C08F 120/18 (2013.01); C09D 11/101 (2013.01); C09D 11/38 (2013.01); G03F 7/028 (2013.01);
Abstract

A photocurable composition can comprise a polymerizable material, at least one non-reactive polymer, and a photoinitiator, wherein the non-reactive polymer can have a carbon content of at least 80% based on the total weight of the non-reactive polymer; a molecular weight of the at least one non-reactive polymer can be at least 750 g/mol and not greater than 20,000 g/mol; an amount of the non-reactive polymer may be at least 10 wt % and not greater than 30 wt %; and a viscosity of the photocurable composition may be not greater than 110 mPa·s. The photocurable composition may have a low linear shrinkage after curing, a high carbon content and high etch resistance and being suitable for AIP or NIL processing.


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