The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Nov. 07, 2022
Applicant:

Kabushiki Kaisha Tokai-rika-denki-seisakusho, Aichi-ken, JP;

Inventors:

Kazuyuki Yokoyama, Aichi, JP;

Suguru Fujisaki, Aichi, JP;

Nobuhiro Kudo, Aichi, JP;

Kazuya Umino, Aichi, JP;

Toshiya Ito, Aichi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B62D 35/00 (2006.01); B62D 35/02 (2006.01); B60R 16/00 (2006.01);
U.S. Cl.
CPC ...
B62D 35/005 (2013.01); B62D 35/02 (2013.01); B60R 16/005 (2013.01);
Abstract

A flow deflecting device includes a flow deflecting body configured to be deployed and retracted; a rotational mechanism, whereby the flow deflecting body is rotatable in an engaged state at the rotational mechanism; and a limiting mechanism, whereby rotation of the flow deflecting body is limitable in an engaged state at the limiting mechanism. In a case in which the flow deflecting body in a deployed position is acted upon by a first external force, engagement with the rotational mechanism is released, and the flow deflecting body is rotated in the retraction direction in the engaged state at the limiting mechanism. In a case in which the flow deflecting body in a retracted position is acted upon by a second external force, engagement with the limiting mechanism is released, and the flow deflecting body is rotated in the retraction direction in the engaged state at the rotational mechanism.


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