The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Mar. 31, 2022
Applicant:

Research & Business Foundation Sungkyunkwan University, Suwon-si, KR;

Inventors:

Hyun Suk Jung, Seoul, KR;

Gil Sang Han, Gunpo-si, KR;

Hee Jung Kim, Incheon, KR;

Jae Myeong Lee, Jincheon-gun, KR;

Jin Hyuk Choi, Suwon-si, KR;

Jaesang Lee, Seoul, KR;

Jaesung Kim, Seoul, KR;

Jaemin Choi, Namyangju-si, KR;

Saein Suh, Gochang-gun, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 63/08 (2006.01); B01D 67/00 (2006.01); B01D 71/02 (2006.01); B01J 20/04 (2006.01); B01J 20/06 (2006.01); B01J 20/28 (2006.01); B01J 20/282 (2006.01); B01J 20/30 (2006.01); C02F 1/28 (2023.01); C02F 1/44 (2023.01); C02F 101/20 (2006.01); C02F 101/30 (2006.01);
U.S. Cl.
CPC ...
B01J 20/06 (2013.01); B01D 67/0053 (2013.01); B01D 71/024 (2013.01); B01J 20/041 (2013.01); B01J 20/048 (2013.01); B01J 20/28007 (2013.01); B01J 20/28033 (2013.01); B01J 20/28052 (2013.01); B01J 20/282 (2013.01); B01J 20/3064 (2013.01); B01J 20/3078 (2013.01); C02F 1/44 (2013.01); B01J 2220/52 (2013.01); C02F 2101/20 (2013.01); C02F 2101/30 (2013.01);
Abstract

The present application relates to a method for manufacturing an inverse opal structure membrane filter, the method comprising the steps of: preparing a mixed solution by mixing a nanoparticle dispersion solution and a sacrificial particle dispersion solution; applying the mixed solution onto a substrate to dry it; and heat-treating the mixed solution, wherein the surface of the sacrificial particles is modified by positive charges or negative charges.


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