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H01L 27/12 (2006.01); H10D 86/01 (2025.01); H10K 59/131 (2023.01); H10K 71/00 (2023.01); H10K 71/20 (2023.01); H10K 71/40 (2023.01); H10K 85/50 (2023.01); H10K 59/12 (2023.01);

U.S. Cl.

CPC ...

H10K 71/20 (2023.02); H10D 86/0212 (2025.01); H10K 59/131 (2023.02); H10K 71/00 (2023.02); H10K 71/40 (2023.02); H10K 85/50 (2023.02); H10K 59/1201 (2023.02);

Abstract

A method for manufacturing an array substrate includes: forming a patterned film layer on a side of a substrate, wherein the patterned film layer is provided with a plurality of grooves; forming a first precursor structure in the groove, wherein a material of the first precursor structure includes a first precursor; and disposing, in an environment of a gaseous second precursor, the substrate on which the first precursor structure is formed, such that the gaseous second precursor is reacted with the first precursor structure to form a perovskite crystal structure; wherein one of the first precursor and the gaseous second precursor includes a metal halide, and the other of the first precursor and the gaseous second precursor includes one of a formamidine halide, a methyl-amine halide, a cesium halide, and a hydrogen sulfide.

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