The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

Nov. 04, 2022
Applicants:

Denso Corporation, Kariya, JP;

Toyota Jidosha Kabushiki Kaisha, Toyota, JP;

Mirise Technologies Corporation, Nisshin, JP;

Inventors:

Hiroki Tsuma, Nisshin, JP;

Yuji Nagumo, Nisshin, JP;

Masashi Uecha, Nisshin, JP;

Teruaki Kumazawa, Nisshin, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 62/832 (2025.01); H01L 21/02 (2006.01); H01L 21/04 (2006.01); H01L 21/78 (2006.01); H10D 8/01 (2025.01); H10D 8/60 (2025.01); H10D 12/01 (2025.01); H10D 30/66 (2025.01); H10D 62/10 (2025.01); H10D 62/40 (2025.01); H10D 64/23 (2025.01); H10D 64/62 (2025.01);
U.S. Cl.
CPC ...
H10D 62/8325 (2025.01); H01L 21/02008 (2013.01); H01L 21/02447 (2013.01); H01L 21/02529 (2013.01); H01L 21/02598 (2013.01); H01L 21/78 (2013.01); H10D 8/60 (2025.01); H10D 12/031 (2025.01); H10D 62/40 (2025.01); H01L 21/0485 (2013.01); H01L 2924/00 (2013.01); H01L 2924/0002 (2013.01); H10D 8/051 (2025.01); H10D 30/665 (2025.01); H10D 62/106 (2025.01); H10D 62/405 (2025.01); H10D 64/252 (2025.01); H10D 64/62 (2025.01);
Abstract

A silicon carbide semiconductor device includes a silicon carbide semiconductor layer and a side silicide layer. The silicon carbide semiconductor layer includes a silicon carbide single crystal and has a main surface, a rear surface opposite to the main surface, and a side surface connecting the main surface and the rear surface and formed by a cleavage plane. The silicon carbide semiconductor layer further includes a modified layer. The modified layer forms a part of the side surface located close to the rear surface and has an atomic arrangement structure of silicon carbide different from an atomic arrangement structure of the silicon carbide single crystal. The side silicide layer includes a metal silicide that is a compound of a metal element and silicon. The side silicide layer is disposed on the side surface of the silicon carbide semiconductor layer and is adjacent to the modified layer.


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