The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

Mar. 29, 2021
Applicant:

Nissan Chemical Corporation, Tokyo, JP;

Inventors:

Yuto Hashimoto, Toyama, JP;

Tokio Nishita, Toyama, JP;

Yuki Endo, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/027 (2006.01); C09D 163/04 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0271 (2013.01); C09D 163/04 (2013.01); G03F 7/094 (2013.01);
Abstract

A protective film-forming composition excelling in preservation stability and having a favorable masking (protection) function against wet etching solutions when processing a semiconductor substrate, a protective film manufactured by using the composition, a substrate with a resist pattern, and a method for manufacturing a semiconductor device. The protective film-forming composition provides protection against wet etching solutions for semiconductors and contains: a polymer having a unit structure represented by Formula (1-1): Ar represents a benzene ring, a naphthalene ring, or an anthracene ring; Rrepresents a hydroxy group, a mercapto group; n1 represents an integer from 0-3; n2 represents 1 or 2; Lrepresents a single bond or an alkylene group that has 1-10 carbons; E represents an epoxy group; when n2=1, Trepresents an alkylene group that has 1-10 carbons; and when n2=2, Trepresents a nitrogen atom or an amide bond.


Find Patent Forward Citations

Loading…