Active gas generation apparatus

Abstract

An object of the present disclosure is to obtain an active gas generation apparatus capable of supplying a highly concentrated active gas from a gas ejection port to a processing space at a subsequent stage. Then, in the active gas generation apparatus () of the present disclosure, in a main dielectric space being a space in which an electrode dielectric film () and an electrode dielectric film () face each other, a region where electrode conductive films () and () overlap each other in a plan view is defined as a main discharge space (). In an auxiliary dielectric space being a space where the electrode dielectric filmand a shield dielectric filmface each other, a region including a dielectric through hole () and a cover through hole () is defined as an auxiliary discharge space (). The auxiliary discharge space () includes a part of a buffer space () above the shield dielectric film (), and a path leading from the auxiliary discharge space () to the gas ejection port () is defined as an active gas flow path.